Gate device with raised channel and method

ABSTRACT

A method for fabricating a gate device includes forming an elongated projection ( 422 ) on a substrate ( 412 ) The elongated projection ( 422 ) protrudes from a surrounding area ( 424 ) of the substrate ( 412 ) and includes an access channel ( 434 ) for the gate device. A first terminal ( 430 ) and a second terminal ( 432 ) are formed and coupled to the access channel ( 434 ) in the elongated projection. A gate structure ( 522 ) is formed and operable to control the access channel ( 434 ) to selectively couple the first terminal ( 430 ) to the second terminal ( 432 ).

RELATED APPLICATION

[0001] This application is related to copending U.S. application Ser.No.______, entitled “Gate Device with Access Channel Formed in DiscretePost and Method” (Attorney's Docket No.______ TI-28216 and copendingU.S. application Ser. No. , entitled “Method for Two-Sided Fabricationof a Memory Array” (Attorney's Docket No. TI-23232).

TECHNICAL FIELD OF THE INVENTION

[0002] This invention relates generally to electronic devices, and moreparticularly to a gate device with a raised channel and to a method forfabricating the same.

BACKGROUND OF THE INVENTION

[0003] Modern electronic equipment such as televisions, telephones,radios and computers are generally constructed of solid state devices.Solid state devices are preferred in electronic equipment because theyare extremely small and relatively inexpensive. Additionally, solidstate devices are very reliable because they have no moving parts, butare based on the movement of charge carriers.

[0004] Solid state devices may be transistors, capacitors, resistors,and other semiconductor devices. Typically, such devices are fabricatedon a substrate and interconnected to form memory arrays, logicstructures, timers and other integrated circuits. One type of memoryarray is a dynamic random access memory (DRAM) in which memory cellsretain information only temporarily and are refreshed at periodicintervals. Despite this limitation, DRAMs are widely used because theyprovide low cost per bit of memory, high device density, and feasibilityof use.

[0005] DRAMs typically include an array of memory cells accessed by aseries of word lines and bit lines. Each memory cell includes an accesstransistor coupled to a storage capacitor. The access transistor isformed from a portion of a word line disposed over a channel that isdefined in an underlying substrate. A source and drain for the accesstransistor are also defined in the substrate. The source is shared withan adjacent access transistor and connected to a bit line. The drain isconnected to the storage node.

[0006] Efforts to increase DRAM density have concentrated on minimizingthe planar area of the memory cells. The planar area of the cells,however, is constrained by the configuration of the access transistor,the storage node, the word line, and the bit line.

SUMMARY OF THE INVENTION

[0007] In accordance with the present invention, an improved gate deviceand method are provided that substantially eliminate or reducedisadvantages and problems associated with previously developed systemsand methods. In particular, the present invention provides a highdensity gate device for a memory array or other integrated circuit.

[0008] In one embodiment of the present invention, a method forfabricating a gate device includes forming an elongated projection on asubstrate. The elongated projection protrudes from a surrounding area ofthe substrate and includes an access channel for the gate device. Afirst terminal and a second terminal are formed and coupled to theaccess channel in the elongated projection. A gate structure is formedand operable to control the access channel to selectively couple thefirst terminal to the second terminal through the access channel in theelongated projection.

[0009] More specifically, in accordance with one embodiment of thepresent invention, the gate device is used for a memory cell. In thisembodiment, a storage node is coupled to the first terminal and a bitline is coupled to the second terminal. The gate structure is operableto control the access channel to selectively couple the bit line to thestorage node.

[0010] Technical advantages of the present invention include providing avery high density gate device for memory arrays and other integratedcircuits. In particular, the gate device has a raised channel formed inan elongated projection with individual source and drain terminals forthe channel. The terminals may be formed in or adjacent to the elongatedprojection. In either case, the use of individual source and drainterminals allows the gate device to be scaled down to minimal isolationbetween devices.

[0011] Other technical advantages of the present invention will bereadily apparent to one skilled in the art from the following figures,description, and claims.

BRIEF DESCRIPTION OF THE DRAWINGS

[0012] For a more complete understanding of the present invention andits advantages, reference is now made to the following description takenin conjunction with the accompanying drawings, in which:

[0013] FIGS. 1A-S are a series of schematic cross-sectional diagramsillustrating fabrication of a memory array in accordance with oneembodiment of the present invention;

[0014] FIGS. 2A-E are a series of top-plan and perspective diagramsillustrating the memory array of FIG. 1 at different stages of thefabrication process;

[0015] FIGS. 3A-S are a series of schematic cross-sectional diagramsillustrating fabrication of a memory array in accordance with anotherembodiment of the present invention;

[0016] FIGS. 4A-D are a series of top-plan diagrams illustrating thememory array of FIG. 3 at different stages of the fabrication process;

[0017] FIGS. 5A-S are a series of schematic cross-sectional diagramsillustrating fabrication of a memory array in accordance with stillanother embodiment of the present invention; and

[0018] FIGS. 6A-D are a series of top-plan diagrams illustrating thememory array of FIG. 5 at different stages of the fabrication process.

DETAILED DESCRIPTION OF THE INVENTION

[0019] The preferred embodiments of the present invention and theiradvantages are best understood by referring to FIG. 1-6 of the drawings,in which like numerals refer to like parts throughout the several views.

[0020]FIGS. 1 and 2 illustrate fabrication of a memory array inaccordance with one embodiment of the present invention. For theembodiment of FIGS. 1 and 2, the memory array is a high-density dynamicrandom access memory (DRAM) having tight pitch memory cells. Each memorycell includes a storage node, a gate device to control access to thestorage node, and a bit line to access the storage node. The memorycells, storage nodes, gate devices, and method of the present inventionmay be used in connection with other suitable types of memory cells,memory arrays, and electronic circuits.

[0021] Referring to FIG. 1A, an initial DRAM structure 10 includes asubstrate 12 having a first side 14 and a second, opposite side 16. Thesubstrate 12 may be a semiconductive or insulative wafer, an epitaxialor other layer formed on a wafer or other underlying structure, asemiconductor on insulator (SOI) system, and the like. As described inmore detail below, a first portion of the DRAM is formed on the firstside 14 of the substrate 12 while a second portion of the DRAM is formedon the second side 16 of the substrate 12. As a result, topology of theDRAM is improved, which reduces process complexity and cost whileincreasing yield.

[0022] A plurality of recesses 18 are formed on the first side 14 of thesubstrate 12. The recesses 18 are formed by a conventional wet etch orother suitable process. The recesses 18 are each sized for formation ofthe first portion of a sub-array for the DRAM. The second portion ofeach sub-array is fabricated on the second side 16 of the substrate 12opposite the first portion of the sub-array. For a 64 megabyte DRAM, thesubstrate 12 includes sixteen (16) recesses 18 each sized for formationof a four (4) megabyte sub-array. The sub-arrays may use a conventionallayout scheme to allow bit line compare.

[0023] Referring to FIG. 1B, an exemplary recess 18 is illustrated todescribe fabrication of the first portion of the sub-array. Other firstportions of other sub-arrays for the DRAM are similarly fabricated inother recesses 18 using the same process steps. A photolithographic mask20 is conventionally formed outwardly from the first side 14 of thesubstrate 12. The mask 20 is patterned to form a plurality of discreteposts 22 on the first side 14 of the substrate 12. The posts 22 arediscrete in that each post 22 is separate and distinct from the otherposts. As is described in more detail below, the discrete posts 22 eachprotrude from a surrounded area 24 of the first side 14 of the substrate12 and include an access channel of a gate device for a memory cell. Theaccess channel comprises semiconductor or other suitable material thatis operable to be controlled by a later formed gate structure toselectively couple different elements of the gate device to each otherto allow access to the memory cell. The discrete post 22 may be formeddirectly from the substrate 12, from one or more intermediate layersdisposed between the mask 20 and the substrate 12, or a combination ofthe substrate 12 and one or more intermediate layers.

[0024] For the embodiment of FIG. 1B, the mask 20 is formed directly onthe first side 14 of the substrate 12. Portions of the substrate 12exposed by the mask 20 are etched through the mask 20 to form thediscrete posts 22 from the substrate 12. In this embodiment, thesubstrate 12 comprises slightly doped silicon or other suitablesemiconductor material. The etch is a conventional anisotropic etch,other suitable etch, or other suitable series of etches capable ofremoving a portion of the exposed substrate 12. After the each process,the mask 20 may be conventionally removed from the discrete posts 22 ormay remain in place to protect the top of the discrete posts 22 fromdoping to form a first terminal and a second terminal for each gatedevice in the discrete posts 22.

[0025] Referring to FIG. 1C, a first terminal 30 and a second terminal32 are formed in each discrete post 22. As used herein, each means eachof at least a subset of the identified items. An access channel 34 isdefined in each discrete post 22 between the first and second terminals30 and 32. The access channel 34 forms a path between the first andsecond terminals 30 and 32 that is operable to be controlled by a laterformed gate structure to selectively couple the first terminal 30 to thesecond terminal 32 to allow access to the memory cell. Together, thelater formed gate structure, the first and second terminals 30 and 32,and the access channel 34 form the gate device for the memory cell. Thefirst and second terminals 30 and 32 are a source and a drain or othersuitable types of electrodes for the gate device. For the exemplary DRAMembodiment of FIGS. 1 and 2, the gate devices are metal oxidesemiconductor field effect transistors (MOSFET).

[0026]FIG. 2A is a perspective diagram illustrating the first and secondterminals 30 and 32 and the access channel 34 in the discrete post 22.Referring to FIG. 2A, the first terminal 30 is formed at a first edge 36of the discrete post 22 and the second terminal 32 is formed at asecond, opposite edge 38 of the discrete post 22. The access channel 34is defined in the discrete post 22 between the first and secondterminals 30 and 32. Accordingly, the gate device has a raised channelwith individual source and drain terminals 30 and 32. The individualterminals 30 and 32 allow the gate devices to be scaled down to minimalisolation between devices. Accordingly, very high density DRAM and othermemory arrays or integrated circuits may be fabricated.

[0027] The height of the discrete post 22 is preferably minimized toreduce resistance in the first and second terminals 30 and 32. However,depending on planarizing techniques later used to expose the discretepost 22 on the second side 16 of the substrate 12, the height of thediscrete post 22 may be increased to ensure that the discrete post 22remain after planarization.

[0028] FIGS. 2B-D are a series of top-plan views illustrating formationof the first and second terminals 30 and 32 in the discrete posts 22 inaccordance with several embodiments of the present invention. In theseembodiments, the first and second terminals 30 and 32 are formed in thediscrete posts 22 by dopant implantation.

[0029] Referring to FIG. 2B, dopants 40 are directionally implanted atan angle into the discrete posts 22 to form the first terminals 30 atthe first edges 36 of the discrete posts 22 and the second terminals 32at the second edges 38 of the discrete posts 22. In this embodiment, themask 20 remains in place to keep the first and second terminals 30 and32 separate at the top of the discrete posts 22. The dopants 40 areangled to provide full coverage along the height of the discrete posts22 and directed such that each row of discrete posts 22 protects theaccess channels 34 in the next row of discrete posts 22 from dopantimplantation and thus keeps the terminals 30 and 32 separate along theheight of the discrete posts 22. The angle and direction of the dopants40 are varied based on the height, size, and spacing of the discreteposts 22 and other suitable criteria.

[0030] Referring to FIG. 2C, the surrounding area 24 between thediscrete posts 22 on the first side 14 of the substrate 12 isconventionally backfilled by growing a thermal oxide on the discreteposts 22 and on the surrounding area 24 of the first side 14 of thesubstrate 12 followed by an oxide fill. A photolithographic mask 42 isconventionally formed outwardly of the discrete posts 22 and thebackfill layer. The mask 42 exposes the first and second edges 36 and 38of the discrete posts 22 as well as the portion of the access channels34 between the first and second edges 36 and 38 at the top of thediscrete posts 22. Portions of the backfill layer exposed by the mask 42are conventionally removed to fully expose the first and second edges 36and 38 along the height of the discrete posts 22. Dopants 44 areimplanted from opposite directions and at an angle into the tops, firstedges 36, and second edges 38 of the discrete posts 22 to form the firstterminals 30 at the first edges 36 of the discrete posts 22 and thesecond terminals 32 at the second edges 38 of the discrete posts 22. Theangle of dopant implant is varied based on the height and spacing of thediscrete posts 22 and other suitable criteria. After the doping processis complete, the mask 42 and remaining backfill layer are conventionallyremoved. The tops of the discrete posts 22 are conventionally planarizedto remove the doped section of the access channel regions and separatethe first and second terminals 30 and 32 in the discrete posts 22.

[0031] Referring to FIG. 2D, the surrounding area 24 between thediscrete posts 22 on the first side 14 of the substrate 12 isconventionally backfilled and a photolithographic mask 46 isconventionally formed outwardly of the discrete posts 22 and thebackfill layer. The mask 46 is patterned to expose only the first andsecond edges 36 and 38 of the discrete posts 22. Portions of thebackfill layer exposed by the mask 46 are conventionally removed tofully expose the first and second edges 36 and 38 along the height ofthe discrete posts 22. Dopants 48 are implanted from opposite directionsand at an angle into the first and second edges 36 and 38 of thediscrete posts 22 to form the first terminals 30 at the first edges 36of the discrete posts 22 and the second terminals 38 at the second edgesof the discrete posts 22. The angle of dopant implant is varied based onthe height and spacing of the discrete posts 22 and other suitablecriteria. After the doping process is complete, the mask 46 andremaining backfill layer are conventionally removed.

[0032] Referring to FIG. 1D, a fill layer 60 is formed outwardly fromthe first side 14 of the substrate 12 in the surrounding area 24 betweenthe discrete posts 22. The fill layer 60 comprises a dielectric materialcapable of insulating the first and second terminals 30 and 32 of eachdiscrete post 22 from each other and from other terminals 30 and 32 ofother discrete posts 22. For the exemplary DRAM embodiment of FIGS. 1and 2, the fill layer 60 comprises conventionally deposited oxide.

[0033] A bias strip layer 62 is formed outwardly from the discrete posts22 and the fill layer 60. The bias strip layer 62 comprises a conductivematerial capable of biasing the access channels 34 in the discrete posts22. For the exemplary DRAM embodiment of FIGS. 1 and 2, the bias striplayer 62 comprises a conventionally deposited metal.

[0034] Referring to FIG. 1E, a photolithographic mask 64 isconventionally formed outwardly from the bias strip layer 62. The mask64 is patterned to form bias strips 66 from the bias strip layer 62. Thebias strips 66 couple the access channels 34 to a biasing system inorder to reduce threshold voltage of the gate devices.

[0035] Portions of the bias strip layer 62 exposed by the mask 64 areetched through the mask 64 to form the bias strips 66. The etch is aconventional anisotropic etch, other suitable etch, or other suitableseries of etches capable of selectively removing the exposed material ofthe bias strip layer 62 from the discrete posts 22 and the fill layer60. After the etched process, the mask 64 is conventionally removed fromthe bias strips 66.

[0036] Referring to FIG. 1F, an insulative layer 70 is formed outwardlyfrom the discrete posts 22, fill layer 60, and bias strips 66. Theinsulative layer 70 comprises a dielectric material capable ofinsulating the bias strips 66 from the later formed elements of theDRAM. For the exemplary DRAM embodiment of FIGS. 1 and 2, the insulativelayer 70 comprises a conventionally deposited oxide.

[0037] Referring to FIG. 1G, a photolithographic mask 72 isconventionally formed outwardly from the insulative layer 70. The mask72 is patterned to Form storage node contact holes 74 in the insulativelayer 70. As described in more detail below, storage node contacts areformed in the contact holes 74. The storage node contacts each connect afirst terminal 30 of a gate device with a later formed storage node fora memory cell.

[0038] Portions of the insulative layer 70 exposed by the mask 72 areetched through the mask 72 to form the storage node contact holes 74.The contact holes 74 expose the first terminals 30 of the discrete posts22. The etch is a conventional anisotropic etch, other suitable etch, orother suitable series of etches capable of selectively removing theexposed material of the insulative layer 70 from the first terminals 30.After the etch process, the mask 72 is conventionally removed from theinsulative layer 70.

[0039] Referring to FIG. 1H, a contact layer 80 is formed outwardly fromthe insulative layer 70 and in the contact holes 74. The contact layer80 comprises a conductive material capable of connecting the firstterminal 30 of each gate device with a later formed storage node. Forthe exemplary DRAM embodiment of FIGS. 1 and 2, the contact layer 80comprises a conventionally deposited metal.

[0040] Referring to FIG 1T, a photolithographic mask 82 isconventionally formed outwardly from the contact layer 80. The mask 82is patterned to form storage node contacts 84 from the contact layer 80.The storage node contacts 84 each connect to a first terminal 32 andextend through an overlying contact hole 74 to provide an enlargedcontact area 86 for a later formed storage node.

[0041] Portions of the contact layer 80 exposed by the mask 82 areetched through the mask 82 to form the storage node contacts 84. Theetch is a conventional anisotropic etch, other suitable etch, or othersuitable series of etches capable of selectively removing the exposedmaterial of the contact layer 80 from the insulative layer 70. After theetch process, the mask 82 is conventionally removed from the contacts84.

[0042] Referring to FIG. 1J, a storage node layer 90 is formed outwardlyfrom the insulative layer 70 and the storage node contacts 84. Asdescribed in more detail below, the storage nodes are formed within thestorage node layer 90. The storage node layer 90 comprises a dielectricmaterial capable of insulating the later formed storage nodes from eachother. The thickness of the storage node layer 90 is varied based on thedesired height and thus capacitance of the storage nodes. For theexemplary DRAM embodiment of FIGS. 1 and 2, the storage node layer 90comprises a conventionally deposited oxide.

[0043] Referring to FIG. 1K, a photolithographic mask 92 isconventionally formed outwardly from the storage node layer 90. The mask92 is patterned to form storage node holes 94 in the storage node layer90. As described in more detail below, storage nodes for the memorycells are formed in the storage node holes 94. These storage nodes eachstore information for a memory cell.

[0044] Portions of the storage node layer 90 exposed by the mask 92 areetched through the mask 92 to form the storage node holes 94. Thestorage node holes 94 expose the storage node contacts 84. The etch is aconventional anisotropic etch, other suitable etch, or other suitableseries of etches capable of selectively removing the exposed material ofthe storage node layer 90 from the storage node contacts 84. The storagenode contacts 84 preferably act as an etch stop to the deep etch of thestorage node layer 90. After the etch process, the mask 92 isconventionally removed from the storage node layer 90.

[0045] Referring to FIG. 1L, a storage node 100 is formed in a storagenode hole 94 for each memory cell. For the exemplary DRAM embodiment ofFIGS. 1 and 2, the storage node 100 is a stacked capacitor having abottom electrode 102, a capacitor dielectric 104, and a top electrode106. The bottom electrode 102 comprises a doped polysilicon layerconventionally deposited in the storage node holes 94. The dopedpolysilicon layer is conventionally ruggedized to increase the surfacearea between the first and second electrodes 102 and 106. The capacitordielectric 104 comprises a nitride and oxide dielectric layerconventionally deposited outwardly from the bottom electrodes 102. Thetop electrode 106 is a field plate. The field plate comprises dopedpolysilicon deposited to fill the remaining portion of the storage nodeholes 94 and between the storage nodes 100. The plate material may beterminated on an oxide plug at the periphery of the sub-array for easyaccess from the second side 16 of the substrate 12. It will beunderstood that the storage nodes 100 may comprise other configurations,be otherwise formed, or otherwise arranged. For example, the storagenodes 100 may be in several layers.

[0046] Referring to FIG. 1M, the first portion 110 of the sub-array,including the first and second terminals 30 and 32, access channels 34bias strips 66, and storage nodes 100 for each memory cell of thesub-array, is isolated by an insulative cap 112. A support structure 114is mounted to the first side 14 of substrate 12 to provide support forthe substrate 12. The support structure 114 also encapsulates the firstportion 110 of the sub-array and the insulative cap 114 to protect thestorage nodes 100. In one embodiment, the support structure 114comprises a conductor to allow connections between the sub-arrays and toact as a heat sink for the first portion of the DRAM.

[0047] Referring to FIG. 1N, the substrate 12 is flipped to expose thesecond side 16 of the substrate 12 for processing. Because of theadditional support provided by the support structure 114, an excessportion of the second side 16 of substrate 12 may be removed withoutdamaging or unacceptably weakening the substrate 12 or DRAM.

[0048] Referring to FIG. 10, the second side 16 of substrate 12 isplanarized to expose the first and second terminals 30 and 32 and theaccess channels 34 in the discrete posts 22. The second side 16 of thesubstrate may be conventionally planarized by a chemical mechanicalpolish (CMP), etch back, or other suitable process. The planarization iscarefully controlled to ensure that the excess portion is removedwithout removing the discrete posts 22.

[0049] Referring to FIG. 1P, a gate dielectric layer 120 is formedoutwardly from the discrete posts 22 on the second side 16 of thesubstrate 12. A series of gate structures 122 are formed outwardly fromthe dielectric layer 120. The gate structures 122 are each operable tocontrol an underlying access channel 34 to selectively couple the firstterminal 30 to the second terminal 32 to allow access to a storage node100. The gate structures 122 may each be disposed over an access channel34 between the first and second terminals 30 and 32 or otherwisesuitably disposed. For example, as shown in FIG. 2E, the gate structure122 may be disposed over the first and second terminals 30 and 32 inaddition to the access channel 34. In this embodiment, the isolationinterface problems are reduced.

[0050] Each gate structure 122 together with the associated accesschannel 34 and terminals 30 and 32 form a gate device for a memory cell.For the exemplary DRAM embodiment of FIGS. 1 and 2, the gate devices areMOSFET devices and the gate structures are conventionally formed wordlines comprising a gate 124 and a sidewall insulator 126.

[0051] An insulative layer 130 is formed outwardly from the gatedielectric layer 120 and the gate structures 122. The insulative layer130 comprises a dielectric material capable of insulating later formedbit line contacts. For the exemplary DRAM embodiment of FIGS. 1 and 2,the insulative layer 130 comprises a conventionally deposited oxide.

[0052] Referring to FIG. 1Q, a photolithographic mask 132 isconventionally formed outwardly from the insulative layer 130. The mask130 is patterned to form bit line contact holes 134 in the insulativelayer 130. As described in more detail below, bit line contacts areformed in the contact holes 134. The bit line contacts each connect asecond terminal 32 of a gate device with a later formed bit line.

[0053] Portions of the insulative layer 130 exposed by the mask 132 areetched through the mask 132 to form the bit line contact holes 134. Thecontact holes 134 expose the second terminals 32 of the discrete posts22. The etch is a conventional anisotropic etch, other suitable etch, orother suitable series of etches capable of selectively removing theexposed material of the insulative layer 130 from the second terminals32. After the etch process, the mask 132 is conventionally removed fromthe insulative layer 130.

[0054] Referring to FIG. 1R, a bit line layer 140 is formed outwardlyfrom the insulative layer 130 and in the contact holes 134. The bit linelayer 140 comprises a conductive material capable of forming bit lines.For the exemplary DRAM embodiment of FIGS. 1 and 2, the bit line layer140 comprises a conventionally deposited metal.

[0055] The bit line layer 140 is conventionally patterned and etchedusing a photolithographic mask to form a series of bit lines for thesub-array. The bit lines each include a plurality of bit line contacts142 to couple a plurality of memory cells to a sensing circuit forreading accessed information. Information in the sub-array is accessedusing the word lines to couple the bit lines to the storage nodes 100and the bit lines to relay the stored information to a sensing circuit.The word lines and bit lines are controlled by conventional addressinglogic.

[0056] For the exemplary DRAM embodiment, the discrete posts 22 eachhave a 0.6 micron diameter with the terminals 30 and 32 and the accesschannels 34 each having a width of 0.2 microns. The word lines each havea width of 0.2 microns and a spacing of 0.2 microns. The bit lines alsohave a width of 0.2 microns and a spacing of 0.2 microns. The storagenodes each have an area that is 0.4 microns by 0.2 microns.

[0057] Referring to FIG. 1S, the first portion 110 and the secondportion 150 of the DRAM sub-arrays are illustrated. Peripheral circuitdevices 152 may be formed between the sub-arrays using the process stepsto form the second portion of the sub-arrays or other suitableprocesses. Additional contacts 154 between the first and second portionof the sub-array may also be formed using the same or other suitablefabrication steps.

[0058] As shown by FIG. 1S, because the storage nodes 100 are formed onthe first 14, or backside, of the substrate 12, the height of thestorage nodes 100 may be increased without causing topological problemsin the memory array. In addition, storage node materials that wouldotherwise conflict with other components of the memory array may also beused. Accordingly, storage node capacitance is increased withoutincreasing fabrication costs. In addition, taller and less complexstorage node configurations may be used that reduce the cost andincrease yield.

[0059]FIGS. 3 and 4 illustrate fabrication of a memory array inaccordance with another embodiment of the present invention. For theembodiment of FIGS. 3 and 4, the memory array is also a high-densitydynamic random access memory (DRAM) having tight pitch memory cells.Each memory cell includes a storage node, a gate device to controlaccess to the storage node, and a bit line to access the storage node.The memory cells, storage nodes, gate devices, and method of thisembodiment of the present invention may also be used in connection withother suitable types of memory cells, memory arrays, and electroniccircuits.

[0060] Referring to FIG. 3A, an initial DRAM structure 210 includes asubstrate 212 having a first side 214 and a second, opposite side 216.The substrate 212 may be a semiconductive or insulative wafer, anepitaxial or other layer formed on a wafer or other underlyingstructure, a semiconductor on insulator (SOI) system, and the like. Asdescribed in more detail below, a first portion of the DRAM is formed onthe first side 214 of the substrate 212 while a second portion of theDRAM is formed on the second side 216 of the substrate 212. As a result,topology of the DRAM is improved, which reduces process complexity andcost while increasing yield.

[0061] The DRAM is formed from a plurality of sub-arrays. The firstportion of the sub-arrays are fabricated on the first side 214 of thesubstrate 212. The second portion of each sub-array is fabricated on thesecond side 216 of the substrate 212 opposite the first portion of thesub-array. For a 64 megabyte DRAM, the substrate 212 includes sixteen(16) sub-arrays each having four (4) megabytes of memory. The sub-arraysmay use a conventional layout scheme to allow bit line compare.

[0062] Referring to FIG. 3B, an exemplary portion of the substrate 212is illustrated to describe fabrication of a first portion of a sub-arrayfor the DRAM. Other first portions of other sub-arrays for the DRAM aresimilarly fabricated using the same process steps. A photolithographicmask 220 is conventionally formed outwardly from the first side 214 ofthe substrate 212. The mask 220 is patterned to form a plurality ofdiscrete posts 222 on the first side 214 of the substrate 212. The posts222 are discrete in that each post 222 is separate and distinct from theother posts. As described in more detail below, the discrete posts 222each protrude from a surrounding area 224 of the first side 214 of thesubstrate 212 and include an access channel for a gate device of. amemory cell. The access channel comprises semiconductor or othersuitable material that is operable to be controlled by a later formedgate structure to selectively couple different elements of the gatedevice to each other to allow access to the memory cell. The discreteposts 222 may be formed directly from the substrate 212, from one ormore intermediate layers disposed between the mask 220 and the substrate212, or a combination of the substrate 212 and one or more intermediatelayers.

[0063] For the embodiment of FIG. 3B, the mask 220 is formed directly onthe first side 214 of the substrate 212. Portions of the substrate 212exposed by the mask 220 are etched through the mask 220 to form thediscrete posts 222 from the substrate 212. In this embodiment, thesubstrate 212 comprises slightly doped silicon or other suitablesemiconductor material. The etch is a conventional anisotropic etch,other suitable etch, or other suitable series of etches capable ofselectively removing a portion of the exposed substrate 212. After theetch process, the mask 220 is conventionally removed from the discreteposts 222.

[0064] Referring to FIG. 3C, a first terminal 230 and a second terminal232 are formed adjacent to each discrete post 222. An access channel 234is defined in each discrete post 222 between the first and secondterminals 230 and 232. The access channel 234 forms a path between thefirst and second terminals 230 and 232 that is operable to be controlledby a later formed gate structure to selectively couple the firstterminal 230 to the second terminal 232 to allow access to the memorycell. Together, the later formed gate structure, the first and secondterminals 230 and 232, and the access channel 234 form the gate devicefor the memory cell. The first and second terminals 230 and 232 are asource and a drain or other suitable types of electrodes for the gatedevice. For the exemplary DRAM embodiment of FIGS. 3 and 4, the gatedevices are metal oxide semiconductor field effect transistors (MOSFET).

[0065]FIG. 4A is a top-plan view illustrating the first and secondterminals 230 and 232 formed adjacent to the discrete posts 222.Referring to FIG. 4A, the first terminal 230 is formed adjacent to afirst edge 236 of each discrete post 222 and the second terminal 232 isformed adjacent to a second, opposite edge 238 of the discrete post 222.The access channel 234 is defined in the discrete posts 222 between thefirst and second terminals 230 and 232. Accordingly, the gate device hasa raised channel with individual source and drain terminals 230 and 232.The individual terminals 230 and 232 allow the gate devices to be scaleddown to minimal isolation between devices. Accordingly, very highdensity DRAM and other memory devices or integrated circuits may befabricated.

[0066] The first and second terminals 230 and 232 are formed adjacent tothe discrete posts 222 by conventionally depositing a conductive layerin the surrounding area 224 between the discrete posts 222 on the firstside 214 of the substrate 212. A photolithographic mask 242 isconventionally formed outwardly from the discrete posts 222 and theconductive layer. The mask 242 exposes an excess portion of theconductive layer that is removed to leave first terminals 230 adjacentto the first edges 236 of the discrete posts 222 and the secondterminals 232 adjacent to the second edges 238 of the discrete posts222. The excess portion of the conductive layer is removed by aconventional anisotropic etch, other suitable etch, or other suitableseries of etches capable of selectively removing the exposed material ofthe conductive layer from the substrate 212. After the etch process, themask 242 is conventionally removed from the discrete posts 222 and thefirst and second terminals 230 and 232.

[0067] The terminals 230 and 232 are preferably a metal or other highlyconductive material to minimize device resistance. The use of metalterminals 230 and 232 allows the height of the discrete posts 222 to beincreased without unacceptably increasing resistance in the first andsecond terminals 230 and 232. Accordingly, metal terminals 230 and 232may be preferred in applications with high discrete posts 222, highplanarization tolerances, and the like.

[0068] Referring to FIG. 3D, terminal insulators 244 are formed aroundthe exposed sides of the first and second terminals 230 and 232. Theterminal insulators 244 insulate the terminals 230 and 232 from a laterformed bias layer. The terminal insulators 244 comprise oxide or othersuitable dielectric material.

[0069]FIG. 4B is a top-plan view illustrating the terminal insulators244 formed around the first and second terminals 230 and 232. Referringto FIG. 4B, the terminal insulators 244 are formed by conventionallybackfilling the surrounding area 224 between the discrete posts 222 andterminals 230 and 232 on the first side 214 of the substrate 212 with aninsulative layer. A photolithographic mask 246 is conventionally formedoutwardly from the discrete posts 222, the first and second terminals230 and 232, and the backfill layer. The mask 246 exposes an excessportion of the backfill layer that is conventionally removed to leavethe terminal insulators 244. The terminal insulators 244 isolate theterminals 230 and 232 from the surrounding area 224 on the first side214 of the substrate 212 while leaving a portion of the access channels234 exposed to the surrounding area 224 for biasing of the channels 234.The excess portion of the backfill layer is conventionally removed by ananisotropic etch, other suitable etch, or other suitable series ofetches capable of selectively removing exposed portions of the backfilllayer from the underlying substrate 212. After the etch process, themask 246 is conventionally removed.

[0070]FIG. 4C is a top-plan view illustrating a bias layer 248 formed inthe surrounding area 224 between the discrete posts 222 and terminalinsulators 244 on the first side 214 of the substrate 212. The biaslayer 248 comprises a conductive material capable of coupling the accesschannels 234 to a biasing system in order to reduce threshold voltage ofthe gate devices. For the exemplary DRAM embodiment of FIGS. 3 and 4,the bias layer 248 comprises a metal conventionally deposited andplanarized to the height of the discrete casts 222. Each section of thebias layer 248 is coupled to the biasing system. In another embodiment,the terminal insulators 244 may be discrete for each terminal 230 and232. In this embodiment, the bias layer 248 is unitary and need only beconnected to the biasing system at a single system.

[0071] Referring to FIG. 3E, an insulative layer 250 is formed outwardlyfrom the discrete posts 222, the first and second terminals 230 and 232,and the terminal insulators 244. The insulative layer 250 comprises adielectric material capable of insulating later formed bit linecontacts. For the exemplary DRAM embodiment of FIGS. 3 and 4, theinsulative layer comprises a conventionally deposited oxide.

[0072] Referring to FIG. 3F, a photolithographic mask 252 isconventionally formed outwardly from the insulative layer 250. The mask252 is patterned to form bit line contact holes 254 in the insulativelayer 250. As described in more detail below, bit line contacts areformed in the contact holes 254. The bit line contacts each connect asecond terminal 232 of a gate device with a later formed bit line.

[0073] Portions of the insulative layer 250 exposed by the mask 252 areetched through the mask 252 to form the bit line contact holes 254. Thecontact holes 254 expose the second terminals 232 adjacent the discreteposts 222. The etch is a conventional anisotropic etch, other suitableetch, or other suitable series of etches capable of selectively removingthe exposed material of the insulative layer 250 from the secondterminals 232. After the etch process, the mask 252 is conventionallyremoved from the insulative layer 250.

[0074] Referring to FIG. 3G, a bit line layer 260 is formed outwardlyfrom the insulative layer 250 and in the contact holes 254. The bit linelayer 260 comprises a conductive material capable of forming bit lines.For the exemplary DRAM embodiment of FIGS. 3 and 4, the bit line layer260 comprises a conventionally deposited metal.

[0075] Referring to FIG. 3H, a photolithographic mask 262 isconventionally farmed outwardly from the bit line layer 260. The mask262 is patterned to form a series of bit lines 264 from the bit linelayer 260. As described in more detail below, the bit lines 264 eachinclude a plurality of bit line contacts 266 coupled to the secondterminals 232 of the gate devices.

[0076] Portions of the bit line layer 260 exposed by the mask 262 areetched through the mask 262 to form the bit lines 264. The etch is aconventional anisotropic etch, other suitable etch, or other suitableseries of etches capable of selectively removing the exposed material ofthe bit line layer 260 from the insulative layer 250. After the etchprocess, the mask 262 is conventionally removed from the bit lines 264.

[0077]FIG. 4D is a top-plan view illustrating the bit lines 264.Referring to FIG. 4D, the bit lines 264 extend above and to the side ofthe discrete posts 222 with the bit line contacts 266 extending over anddown to the second terminals 232 of the gate devices. Accordingly, thefirst terminals 230 of the gate devices may be later exposed andconnected to storage nodes on the first side 214 of the substrate 212.

[0078] The bit lines 264 couple a plurality of memory cells to a sensingcircuit for reading accessed information. The bit lines 264 may beterminated on an oxide plug at the periphery of the sub-array for easyaccess from the second side 216 of the substrate 212.

[0079] Referring to FIG. 31, an insulative layer 270 is formed outwardlyfrom the insulative layer 250 and the bit lines 264. The insulativelayer 270 comprises a dielectric material capable of insulating the bitlines 264 from later formed elements of the DRAM. For the exemplary DRAMembodiment of FIGS. 3 and 4, the insulative layer 270 comprises aconventionally deposited oxide.

[0080] Referring to FIG. 3J, a photolithographic mask 272 isconventionally formed outwardly from the insulative layer 270. The mask272 is patterned to form storage node contact holes 274 in theinsulative layer 270. As described in more detail below, storage nodecontacts are formed in the contact holes 274. The storage node contactseach connect a first terminal 230 of a gate device with a later formedstorage node for a memory cell.

[0081] Portions of the insulative layer 270 exposed by the mask 272 areetched through the mask 272 to form the storage node contact holes 274.The contact holes 274 expose the first terminals 230 of the gatedevices. The etch is a conventional anisotropic etch, other suitableetch, or other suitable series of etches capable of selectively removingthe exposed material of the insulative layer 270 from the firstterminals 230. After the etch process, the mask 272 is conventionallyremoved from the insulative layer 270.

[0082] Referring to FIG. 3K, a contact layer 280 is formed outwardlyfrom the insulative layer 270 and in the contact holes 274. The contactlayer 280 comprises a conductive material capable of connecting thefirst terminal 230 of each gate device with a later formed storage node.For the exemplary DRAM embodiment of FIGS. 3 and 4, the contact layer280 comprises a conventionally deposited metal.

[0083] Referring to FIG. 3L, a photolithographic mask 232 isconventionally formed outwardly from the contact layer 280. The mask 282is patterned to form storage node contacts 284 from the contact layer280. The storage node contacts 284 each connect to a first terminal 230and extend through an overlying contact hole 274 to provide an enlargedcontact area 236 for a later formed storage node.

[0084] Portions of the contact layer 280 exposed by the mask 282 areetched through the mask 282 to form the storage node contacts 284. Theetch is a conventional anisotropic etch, other suitable etch, or othersuitable series of etches capable of selectively removing the exposedmaterial of the contact layer 260 from the insulative layer 270. Afterthe etch process, the mask 282 is conventionally removed from thecontacts 294.

[0085] Referring to FIG. 3M, a storage node layer 290 is formedoutwardly from the insulative layer 270 and the storage node contacts284. As described in more detail below, the storage nodes are formedwithin the storage node layer 290. The storage node layer 290 comprisesa dielectric material capable of insulating the later formed storagenodes from each other. The thickness of the storage node layer 290 isvaried based on the desired height and thus the capacitance of thestorage nodes. For the exemplary DRAM embodiment of FIGS. 3 and 4, thestorage node layer 290 comprises conventionally deposited oxide.

[0086] Referring to FIG. 3N, a photolithographic mask 292 isconventionally formed outwardly from the storage node layer 290. Themask 292 is patterned to form storage node holes 294 in the storage nodelayer 290. As described in more detail below, storage nodes for thememory cells are formed in the storage node holes 294. The storage nodeseach store information for a memory cell.

[0087] Portions of the storage node layer 290 exposed by the mask 292are etched through the mask 292 to form the storage node holes 294. Thestorage node holes 294 expose the storage node contacts 284. The etch isa conventional anisotropic etch, other suitable etch, or other suitableseries of etches capable of selectively removing the exposed material ofthe storage node layer 290 from the storage node contacts 284. Thestorage node contacts 284 preferably act as an etch stop to the deepetch of the storage node layer 290. After the etch process, the mask 292is conventionally removed from the storage node layer 290.

[0088] Referring to FIG. 30, a storage node 300 is formed in a storagenode hole 294 for each memory cell. For the exemplary DRAM embodiment ofFIGS. 3 and 4, the storage node 300 is a stacked capacitor having abottom electrode 302, a capacitor dielectric 304, and a top electrode306. The bottom electrode 302 comprises a doped polysilicon layerconventionally deposited in the storage node holes 294. The dopedpolysilicon layer is conventionally ruggedized to increase the surfacearea between the first and second electrodes 302 and 306. The capacitordielectric 304 comprises a nitride and oxide dielectric layerconventionally deposited outwardly from the bottom electrodes 302. Thetop electrode 306 is a field plate. The field plate comprises dopedpolysilicon deposited to fill the remaining portion of the storage nodeholes 294 and between the storage nodes 300. The plate material may beterminated on an oxide plug at the periphery of the sub-array for easyaccess from the second side 216 of the substrate 212.

[0089] Referring to FIG. 3P, the first portion 310 of the sub-array,including the first and second terminals 230 and 232, access channels234, and storage nodes 300 for each memory cell of the sub-array, isisolated by an insulative layer 312. The insulative layer 312 comprisesa dielectric material capable of insulating the first portion of thesub-array from other sub-arrays and elements of the DRAM. For theexemplary DRAM embodiment of FIGS. 3 and 4, the insulative layer 312comprises a conventionally deposited oxide.

[0090] A support structure 314 is mounted to the insulative layer 312 onthe first side 214 of the substrate 212 to provide support for thesubstrate 212. The support structure 314 encapsulates the first portion310 of the sub-array to protect the bit lines 264 and the storage nodes300. In one embodiment, the support structure 314 comprises a conductorto allow connections between the sub-arrays and to act as a heat sinkfor the first portion of the DRAM.

[0091] Referring to FIG. 3Q, the substrate 212 is flipped to expose thesecond side 216 of the substrate 212 for processing. Because of theadditional support provided by the support structure 314, an excessportion of the second side 216 of the substrate 212 may be removedwithout damaging or unacceptably weakening the substrate 212 or DRAM.

[0092] Referring to FIG. 3R, the second side 216 of the substrate 212 isplanarized to expose the first and second terminals 230 and 232 adjacentto the discrete posts 222 and the access channels 234 in the discreteposts 222. The second side 216 of the substrate 212 may beconventionally planarized by a chemical mechanical polish (CMP), etchback, or other suitable process. The planarization is carefullycontrolled to ensure that the excess portion of the substrate 212 isremoved without removing or damaging the discrete posts 222.

[0093] Referring to FIG. 3S, a gate dielectric layer 320 is formedoutwardly from the first and second terminals 230 and 232 and accesschannels 234 on the second side 216 of the substrate 212. A series ofgate structures 322 are formed outwardly from the dielectric layer 320.The gate structures 322 are each operable to control an underlyingaccess channel 234 to selectively couple the first terminal 230 to thesecond terminal 232 to allow access to the storage node 300. The gatestructures 322 may each be disposed over an access channel 234 betweenthe first and second terminals 230 and 232 or otherwise suitablydisposed. For examples the gate structures 322 may be disposed over thefirst and second terminals 230 and 232 in addition to the access channel234.

[0094] Each gate structure 322 together with the associated accesschannel 234 and first and second terminals 230 and 232 form a gatedevice for a memory cell. For the exemplary DRAM embodiment of FIGS. 3and 4, the gate devices are MOSFET devices and the gate structures areconventionally formed word lines comprising a gate 324 and a sidewallinsulator 326. The memory cells may have a design rule as previouslydescribed in connection with the DRAM of FIGS. 1 and 2.

[0095] In operation, information in the memory cells is accessed usingthe word lines to couple the bit lines to the storage nodes and the bitlines to relay the stored information to the sensing circuit. The wordlines and bit lines are controlled by conventional addressing logic.Additional contacts may be formed between the first and second portionsof the sub-array and periphery circuit devices may be formed between thesub-arrays of the DRAM using the word line fabrication steps or othersuitable processes as previously described in connection with FIGS. 1and 2.

[0096] An insulative layer 330 is formed outwardly from the gatedielectric layer 320 and the gate structures 322 to complete the secondportion 350 of the sub-array for the DRAM. The insulative layer 330comprises a dielectric material capable of insulating and protecting thegate structures 322 from later formed elements of the DRAM. For theexemplary DRAM embodiment of FIGS. 3 and 4, the insulative layer 330comprises a conventionally deposited oxide. Because the storage nodes300 and the bit lines 264 are formed on the first 214, or backside, ofthe substrate 212, topology is minimized on the top side of the DRAM. Inaddition, the height of the storage nodes 300 may be increased withoutcausing topological problems on the top side in the memory array.Storage node materials that would otherwise conflict with othercomponents of the memory array may also be used. Accordingly, storagenode capacitance is increased without increasing fabrication costs. Inaddition, taller and less complex storage node configurations may beused that reduce the cost and increase yield.

[0097]FIGS. 5 and 6 illustrate fabrication of a memory array inaccordance with still another embodiment of the present invention, Forthe embodiment of FIGS. 5 and 6, the memory array is also a high-densitydynamic random access memory (DRAM) having tight pitch memory cells.Each memory cell includes a storage node, a gate device to controlaccess to the storage node, and a bit line to access the storage node.The memory cells, storage nodes, gate devices, and method of thisembodiment of the present invention may also be used in connection withother suitable types of memory cells, memory arrays, and electroniccircuits.

[0098] Referring to FIG. 5A, an initial DRAM structure 410 includes asubstrate 412 having a first side 414 and a second, opposite side 416.The substrate 412 may be a semiconductive or insulative wafer, anepitaxial or other layer formed on a wafer or other underlyingstructure, a semiconductor on insulator (SOI) system, and the like. Asdescribed in more detail below, a first portion of the DRAM is formed onthe first side 414 of the substrate 412 while a second portion of theDRAM is formed on the second side 416 of the substrate 412. As a result,topology of the DRAM is improved, which reduces process complexity andcost while increasing yield.

[0099] The DRAM is formed from a plurality of sub-arrays. The firstportion of the sub-arrays are fabricated on the first side 414 of thesubstrate 412. The second portion of each sub-array is fabricated on thesecond side 416 of the substrate 412 opposite the first portion of thesub-array. for a 64 megabyte DRAM, the substrate 412 includes sixteen(16) sub-arrays each having four (4) megabytes of memory. The sub-arraysmay use a conventional layout scheme to allow bit line compare.

[0100] Referring to FIG. 5B, an exemplary portion of the substrate 412is illustrated to describe fabrication of a first portion of a sub-arrayfor the DRAM. Other first portions of other sub-arrays for the DRAM aresimilarly fabricated using the same process steps. A photolithographicmask 420 is conventionally formed outwardly from the first side 414 ofthe substrate 412. The mask 420 is patterned to form a plurality ofelongated projections 422 on the first side 414 of the substrate 412.The projections 422 are elongated in that each projection 422 includesaccess channels for a plurality of gate devices. The elongatedprojections 422 each protrude from a surrounding area 424 of the firstside 414 of the substrate 412. The access channels comprisesemiconductor or other suitable material that is operable to becontrolled by a later formed gate structure to selectively coupledifferent elements of the gate device to each other to allow access tothe memory cell. The elongated projections 422 may be formed directlyfrom the substrate 412, from one or more intermediate layers disposedbetween the mask 420 and the substrate 412, or a combination of thesubstrate 412 and one or more intermediate layers.

[0101] For the embodiment of FIG. 5B, the mask 420 is formed directly onthe first side 414 of the substrate 412. Portions of the substrate 412exposed by the mask 420 are etched through the mask 420 to form theelongated projections 422 from the substrate 412. In this embodiment,the substrate 412 comprises slightly doped silicon or other suitablesemiconductor material. The etch is a conventional anisotropic etch,other suitable etch, or other suitable series of etches capable ofselectively removing a portion of the exposed substrate 412. After theetch process, the mask 420 is conventionally removed from the elongatedprojections 422.

[0102] Referring to FIG. 5C, a set of first terminals 430 and a set ofsecond terminals 432 are formed adjacent to each elongated projection422. A plurality of access channels 434 are each defined in theelongated projections 422 between the first and second terminals 430 and432 which are offset between neighboring projections 422, The accesschannels 434 each form a path between the first and second terminals 430and 432 that is operable to be controlled by a later formed gatestructure to selectively couple the first terminal 430 to the secondterminal 432 to allow access to the memory cell. Together, the laterformed gate structure, the first and second terminals 430 and 432, andthe access channel 434 form the gate device for the memory cell. Thefirst and second terminals 430 and 432 are a source and a drain or othersuitable types of electrodes for the gate device. For the exemplary DRAMembodiment of FIGS. 5 and 6, the gate devices are metal oxidesemiconductor field-effect transistors (MOSFET).

[0103]FIG. 6A is a top-plan view illustrating the first and secondterminals 430 and 432 formed adjacent to the elongated projections 422.Referring to FIG. 6A, the first terminals 430 are each formed adjacentto a first edge 436 of the elongated projections 422 and the secondterminals 432 are each formed adjacent to a second, opposite edge 438 ofthe elongated projections 422. The access channels 434 are each definedin the elongated projections 422 between the first and second terminals430 and 432. Accordingly, the gate device has a raised channel withindividual source and drain terminals 430 and 432. The individualterminals 430 and 432 allow the gate devices to be scaled down tominimal isolation between devices. Accordingly, very high density DRAMand other memory devices or integrated circuits may be fabricated.

[0104] The first and second terminals 430 and 432 are formed adjacent tothe elongated projections 422 by conventionally depositing a conductivelayer in the surrounding area 424 between the elongated projections 422on the first side 414 of the substrate 412. A photolithographic mask 442is conventionally formed outwardly from the discrete posts 422 and theconductive layer. The mask 442 exposes an excess portion of theconductive layer that is removed to leave first terminals 430 adjacentto the first edges 436 of the elongated projections 422 and the secondterminals 432 adjacent to the second edges 438 of the elongatedprojections 422. The excess portion of the conductive layer is removedby a conventional anisotropic etch, other suitable etch, or othersuitable series of etches capable of selectively removing the exposedmaterial of the conductive layer from the substrate 412. After the etchprocess, the mask 442 is conventionally removed from the elongatedprojections 422 and the first and second terminals 430 and 432. It willbe understood that the terminals 430 and 432 may be otherwise formed.For example, the terminals 430 and 432 may be doped in the edges of theelongated projections 422.

[0105] The terminals 430 and 432 are preferably a metal or other highlyconductive material to minimize device resistance. The use of metalterminals 430 and 432 allows the height of the elongated projections 422to be increased without unacceptably increasing resistance in the firstand second terminals 430 and 432. Accordingly, metal terminals 430 and432 may be preferred in applications with high elongated projections422, high planarization tolerances, and the like.

[0106] Referring to FIG. 5D, terminal insulators 444 are formed aroundthe exposed sides of the first and second terminals 430 and 432. Theterminal insulators 444 insulate the terminals 430 and 432 from a laterformed bias layer. The terminal insulators 444 comprise oxide or othersuitable dielectric material.

[0107]FIG. 6B is a top-plan view illustrating the terminal insulators444 formed around the first and second terminals 430 and 432. Referringto FIG. 6B, the terminal insulators 444 are formed by conventionallybackfilling the surrounding area 424 between the elongated projections422 and terminals 430 and 432 on the first side 414 of the substrate 412with an insulative layer. A photolithographic mask 446 is conventionallyformed outwardly from the elongated projections 422, the first andsecond terminals 430 and 432, and the backfill layer. The mask 446exposes an excess portion of the backfill layer that is conventionallyremoved to leave the terminal insulators 444. The terminal insulators444 isolate the terminals 430 and 432 from the surrounding area 424 onthe first side 414 of the substrate 412 while leaving a portion of theelongated projections 422 exposed to the surrounding area 424 forbiasing of the access channels 434. The excess portion of the backfilllayer is conventionally removed by an anisotropic etch, other suitableetch, or other suitable series of etches capable of selectively removingexposed portions of the backfill layer from the underlying substrate412. After the etch process, the mask 446 is conventionally removed.

[0108]FIG. 6C is a top-plan view illustrating a bias layer 448 formed inthe surrounding area 424 between the elongated projections 422 andterminal insulators 444 on the first side 414 of the substrate 412. Thebias layer 448 comprises a conductive material capable of coupling theaccess channels 434 to a biasing system in order to reduce thresholdvoltage of the gate devices. For the exemplary DRAM embodiment of FIGS.5 and 6, the bias layer 449 comprises a metal conventionally depositedand planarized to the height of the elongated projections 422.

[0109] Referring to FIG. 5E, an insulative layer 450 is formed outwardlyfrom the elongated projections 422, the first and second terminals 430and 432, and the terminal insulators 444. The insulative layer 450comprises a dielectric material capable of insulating later formed bitline contacts. For the exemplary DRAM embodiment of FIGS. 5 and 6, theinsulative layer comprises a conventionally deposited oxide.

[0110] Referring to FIG. 5F, a photolithographic mask 452 isconventionally formed outwardly from the insulative layer 450. The mask452 is patterned to form bit line contact holes 454 in the insulativelayer 450. As described in more detail below, bit line contacts areformed in the contact holes 454. The bit line contacts each connect asecond terminal 432 of a gate device with a later formed bit line.

[0111] Portions of the insulative layer 450 exposed by the mask 452 areetched through the mask 452 to form the bit line contact holes 454. Thecontact holes 454 expose the second terminals 432 adjacent the elongatedprojections 422. The etch is a conventional anisotropic etch, othersuitable etch, or other suitable series of etches capable of selectivelyremoving the exposed material of the insulative layer 450 from thesecond terminals 432. After the etch process, the mask 452 isconventionally removed from the insulative layer 450.

[0112] Referring to FIG. 5G, a bit line layer 460 is formed outwardlyfrom the insulative layer 450 and in the contact holes 454. The bit linelayer 460 comprises a conductive material capable of forming bit lines.For the exemplary DRAM embodiment of FIG. 5 and 6, the bit line layer460 comprises a conventionally deposited metal.

[0113] Referring to FIG. 5H, a photolithographic mask 462 isconventionally formed outwardly from the bit line layer 460. The mask462 is patterned to form a series of bit lines 464 from the bit linelayer 460. As described in more detail below, the bit lines 464 eachinclude a plurality of bit line contacts 466 coupled to the secondterminals 432 of the gate devices.

[0114] Portions of the bit line layer 460 exposed by the mask 462 areetched through the mask 462 to form the bit lines 464. The etch is aconventional anisotropic etch, other suitable etch, or other suitableseries of etches capable of selectively removing the exposed material ofthe bit line layer 460 from the insulative layer 450. After the etchprocess, the mask 462 is conventionally removed from the bit lines 464.

[0115]FIG. 6D is a top-plan view illustrating the bit lines 464.Referring to FIG. 6D, the bit lines 464 extend above and to the side ofthe terminals 430 and 432 with the bit line contacts 466 extending overand down to the second terminals 432 of the gate devices. Accordingly,the first terminals 430 of the gate devices may be later exposed andconnected to storage nodes on the first side 414 of the substrate 412.

[0116] The bit lines 464 couple a plurality of memory cells to a sensingcircuit for reading accessed information. The bit lines 464 may beterminated on an oxide plug at the periphery of the sub-array for easyaccess from the second side 416 of the substrate 412.

[0117] Referring to FIG. 5I, an insulative layer 470 is formed outwardlyfrom the insulative layer 450 and the bit lines 464. The insulativelayer 470 comprises a dielectric material capable of insulating the bitlines 464 from later formed elements of the DRAM. For the exemplary DRAMembodiment of FIGS. 5 and 6, the insulative layer 470 comprises aconventionally deposited oxide.

[0118] Referring to FIG. 5J, a photolithographic mask 472 isconventionally formed outwardly from the insulative layer 470. The mask472 is patterned to form storage node contact holes 474 in theinsulative layer 470. As described in more detail below, storage nodecontacts are formed in the contact holes 474. The storage node contactseach connect a first terminal 430 of a gate device with a later formedstorage node for a memory cell.

[0119] Portions of the insulative layer 470 exposed by the mask 472 areetched through the mask 472 to form the storage node contact holes 474.The contact holes 474 expose the first terminals 430 of the gatedevices. The etch is a conventional anisotropic etch, other suitableetch, or other suitable series of etches capable of selectively removingthe exposed material of the insulative layer 470 from the firstterminals 430. After the etch process, the mask 472 is conventionallyremoved from the insulative layer 470.

[0120] Referring to FIG. 5K, a contact layer 480 is formed outwardlyfrom the insulative layer 470 and in the contact holes 474. The contactlayer 480 comprises a conductive material capable of connecting thefirst terminal 430 of each gate device with a later formed storage node.For the exemplary DRAM embodiment of FIGS. 5 and 6, the contact layer480 comprises a conventionally deposited metal.

[0121] Referring to FIG. 5L, a photolithographic mask 482 isconventionally formed outwardly from the contact layer 480. The mask 482is patterned to form storage node contacts 484 from the contact layer480. The storage node contacts 484 each connect to a first terminal 430and extend through an overlying contact hole 474 to provide an enlargedcontact area 486 for a later formed storage node.

[0122] Portions of the contact layer 480 exposed by the mask 482 areetched through the mask 482 to form the storage node contacts 484. Theetch is a conventional anisotropic etch, other suitable etch, or othersuitable series of etches capable of selectively removing the exposedmaterial of the contact layer 430 from the insulative layer 470. Afterthe etch process, the mask 482 is conventionally removed from thecontacts 484.

[0123] Referring to FIG. 5M, a storage node layer 490 is formedoutwardly from the insulative layer 470 and the storage node contacts484. As described in more detail below, the storage nodes are formedwithin the storage node layer 490. The storage node layer 490 comprisesa dielectric material capable of insulating the later formed storagenodes from each other. The thickness of the storage node layer 490 isvaried based on the desired height and thus the capacitance of thestorage nodes. For the exemplary DRAM embodiment of FIGS. 5 and 6, thestorage node layer 490 comprises a conventionally deposited oxide.

[0124] Referring to FIG. 5N, a photolithographic mask 492 isconventionally formed outwardly from the storage node layer 490. Themask 492 is patterned to form storage node holes 494 in the storage nodelayer 490. As described in more detail below, storage nodes for thememory cells are formed in the storage node holes 494. The storage nodeseach store information for a memory cell.

[0125] Portions of the storage node layer 490 exposed by the mask 492are etched through the mask 492 to form the storage node holes 494. Thestorage node holes 494 expose the storage node contacts 484. The etch isa conventional anisotropic etch, other suitable etch, or other suitableseries of etches capable of selectively removing the exposed material ofthe storage node layer 490 from the storage node contacts 484. Thestorage node contacts 484 preferably act as an etch stop to the deepetch of the storage node layer 490. After the etch process, the mask 492is conventionally removed from the storage node layer 490.

[0126] Referring to FIG. 5O, a storage node 500 is formed in a storagenode hole 494 for each memory cell. For the exemplary DRAM embodiment ofFIGS. 5 and 6, the storage node 500 is a stacked capacitor having abottom electrode 502, a capacitor dielectric 504, and a top electrode506. The bottom electrode 502 comprises a doped polysilicon layerconventionally deposited in the storage node holes 494. The dopedpolysilicon layer is conventionally ruggedized to increase the surfacearea between the first and second electrodes 502 and 506. The capacitordielectric 504 comprises a nitride and oxide dielectric layerconventionally deposited outwardly from the bottom electrodes 502. Thetop electrode 506 is a field plate. The field plate comprises dopedpolysilicon deposited to fill the remaining portion of the storage nodeholes 294 and between the storage nodes 500. The plate material may beterminated on an oxide plug at the periphery of the sub-array for easyaccess from the second side 416 of the substrate 412.

[0127] Referring to FIG. 5P, the first portion 510 of the sub-array,including the first and second terminals 430 and 432, access channels434, and storage nodes 500 for each memory cell of the sub-array, isisolated by an insulative layer 512. The insulative layer 512 comprisesa dielectric material capable of insulating the first portion of thesub-array from other sub-arrays and elements of the DRAM. For theexemplary DRAM embodiment of FIGS. 5 and 6, the insulative layer 512comprises a conventionally deposited oxide.

[0128] A support structure 514 is mounted to the insulative layer 512 onthe first side 414 of the substrate 412 to provide support for thesubstrate 412. The support structure 514 encapsulates the first portion510 of the sub-array to protect the bit lines 464 and the storage nodes500. In one embodiment, the support structure 514 comprises a conductorto allow connections between the sub-arrays and to act as a heat sinkfor the first portion of the DRAM.

[0129] Referring to FIG. 5Q, the substrate 412 is flipped to expose thesecond side 416 of the substrate 412 for processing. Because of theadditional support provided by the support structure 514, an excessportion of the second side 416 of the substrate 412 may be removedwithout damaging or unacceptably weakening the substrate 412 or DRAM.

[0130] Referring to FIG. 5R, the second side 416 of the substrate 412 isplanarized to expose the first and second terminals 430 and 432 adjacentthe elongated projections 422 and the access channels 434 in theelongated projections 422. The second side 416 of the substrate 412 maybe conventionally planarized by a chemical mechanical polish (CMP), etchback, or other suitable process. The planarization is carefullycontrolled to ensure that the excess portion of the substrate 412 isremoved without removing or damaging the elongated projections 422.

[0131] Referring to FIG. 5S, a gate dielectric layer 520 is formedoutwardly from the first and second terminals 430 and 432 and accesschannels 434 on the second side 416 of the substrate 412. A series ofgate structures 522 are formed outwardly from the dielectric layer 520.The gate structures 522 are each operable to control an underlyingaccess channel 434 to selectively couple the first terminal 430 to thesecond terminal 432 to allow access to the storage node 500. The gatestructures 522 may each be disposed over an access channel 434 betweenthe first and second terminals 430 and 432 or otherwise suitablydisposed. For example, the gate structures 522 may be disposed over thefirst and second terminals 430 and 432 in addition to the access channel434.

[0132] Each gate structure 522 together with the associated accesschannel 434 and first and second terminals 430 and 432 form a gatedevice for a memory cell. For the exemplary DRAM embodiment of FIGS. 5and 6, the gate devices are MOSFET devices and the gate structures areconventionally formed word lines comprising a gate 524 and a sidewallinsulator 526. The memory cells may have a design rule as previouslydescribed in connection with the DRAM of FIGS. 1 and 2.

[0133] In operation, information in the memory cells is accessed usingthe word lines to couple the bit lines to the storage nodes and the bitlines to relay the stored information to the sensing circuit. The wordlines and bit lines are controlled by conventional addressing logic.Additional contacts may be formed between the first and second portionsof the sub-array and periphery circuit devices may be formed between thesub-arrays of the DRAM using the word line fabrication steps or othersuitable processes as previously described in connection with FIGS. 1and 2.

[0134] An insulative layer 530 is formed outwardly from the gatedielectric layer 520 and the gate structures 522 to complete the secondportion 550 of the sub-array for the DRAM. The insulative layer 530comprises a dielectric material capable of insulating and protecting thegate structures 522 from later formed elements of the DRAM. For theexemplary DRAM embodiment of FIGS. 5 and 6, the insulative layer 530comprises a conventionally deposited oxide. Because the storage nodes500 and the bit lines 464 are formed on the first 414, or backside, ofthe substrate 412, topology is minimized on the top side of the DRAM. Inaddition, the height of the storage nodes 500 may be increased withoutcausing topological problems on the top side in the memory array.Storage node materials that would otherwise conflict with othercomponents of the memory array may also be used. Accordingly, storagenode capacitance is increased without increasing fabrication costs. Inaddition, taller and less complex storage node configurations may beused that reduce the cost and increase yield.

[0135] Although the present invention has been described with severalembodiments, various changes and modifications may be suggested to oneskilled in the art. It is intended that the present invention encompasssuch changes and modifications as fall within the scope of the appendedclaims.

What is claimed is:
 1. A method for fabricating a gate device,comprising: forming an elongated projection on a substrate, theelongated projection protruding from a surrounding area of the substrateand including an access channel for the gate device; forming a firstterminal and a second terminal coupled to the access channel in theelongated projection; and forming a gate structure operable to controlthe access channel to selectively couple the first terminal to thesecond terminal.
 2. The method of claim 1, wherein the elongatedprojection comprises substrate material and is formed by patterning andetching the substrate.
 3. The method of claim 1, wherein the gatestructure is disposed over the first and second terminals and the accesschannel.
 4. The method of claim 1, wherein the gate structure isdisposed over the access channel between the first and second terminals.5. The method of claim 1, wherein the first and second terminals areformed in the elongated projection.
 6. A method for fabricating a memorycell, comprising: forming an elongated projection on a substrate, theelongated projection protruding from a surrounding area of the substrateand including an access channel for the memory cell; forming a firstterminal and a second terminal coupled to the access channel in theelongated projection; forming a storage node coupled to the firstterminal for the memory cell; forming a bit line coupled to the secondterminal for the memory cell; and forming a gate structure operable tocontrol the access channel to selectively couple the bit line to thestorage node.
 7. The method of claim 6, wherein the elongated projectioncomprises substrate material and is formed by patterning and etching thesubstrate.
 8. The method of claim 6, wherein the first and secondterminals are formed within the elongated projection.
 9. The method ofclaim 8, wherein the first terminal is formed at a first edge of theelongated projection and the second terminal is formed at a second,opposite edge of the elongated projection.
 10. The method of claim 9,wherein the first and second terminals are formed by doping portions ofthe first and second edges of the elongated projection.
 11. The methodof claim 6, wherein the first and second terminals are formed adjacentto the elongated projection.
 12. The method of claim 11, wherein thefirst terminal is formed adjacent to a first edge of the elongatedprojection and the second terminal is formed adjacent to a second,opposite edge of the elongated projection.
 13. The method of claim 12,wherein the terminals are formed by depositing a conductive layeradjacent to the elongated projection and removing an excess portion ofthe conductive layer to isolate a first remaining portion of theconductive layer as the first terminal and to isolate a second remainingportion of the conductive layer as the second terminal.
 14. The nethodfor fabricating a memory array, comprising: forming a plurality ofelongated projections on a substrate, the elongated projections eachprotruding from a surrounding area of the substrate and including anaccess channel for each of a plurality of memory cells; forming a firstterminal and a second terminal for each memory cell, the first andsecond terminals coupled to the access channel for the memory cell;forming a storage node for each memory cell, the storage node coupled tothe first terminal for the memory cell; forming a bit line structure foreach memory cell, the bit line structure coupled to the second terminalfor the memory cell; and forming a gate structure for each memory cell,the gate structure operable to control the access channel to selectivelycouple the bit line to the storage node.
 15. The method of claim 14,wherein the elongated projection comprises substrate material and isformed by patterning and etching the substrate.
 16. The method of claim14, wherein the first and second terminals are formed within theelongated projection.
 17. The method of claim 16, wherein the firstterminal is formed at a first edge of the elongated projection and thesecond terminal is formed at a second, opposite edge of the elongatedprojection.
 18. The method of claim 17, wherein the first and secondterminals are formed by doping portions of the first and second edges ofthe elongated projection.
 19. The method of claim 14, wherein the firstand second terminals are formed adjacent to the elongated projection.20. The method of claim 19, wherein the first terminal is formedadjacent to a first edge of the elongated projection and the secondterminal is formed adjacent to a second, opposite edge of the elongatedprojection.
 21. The method of claim 20, wherein the first and secondterminals for the memory cells are formed by depositing a conductivelayer adjacent to the elongated projections and removing an excessportion of the conductive layer to isolate a first remaining portion ofthe conductive layer as the first terminals and to isolate a secondremaining portion of the conductive layer as the second terminals.